Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Our screening does not flag Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. That is not a guarantee of quality — it means the venue is not on Beall's archive (frozen since 2017) and does not match our name-pattern heuristic. It is listed in Scopus, Web of Science, PubMed, which is a positive signal.

Per our venue index, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena appears in: Scopus, Web of Science, PubMed. Index membership changes over time — confirm on the index's own site before relying on it.

Papers in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena are cited about 2.1 times each within two years of publication, and Scimago places it in Q3, with an h-index of 63. Those are the open equivalents: the Clarivate Journal Impact Factor is a proprietary metric we neither compute nor license, so we show the two-year citation rate and Scimago quartile instead — they answer the same question of how heavily the journal is cited. A citation rate is a property of a field as much as of a journal.

In the Scimago Journal Rank 2025 edition, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena is Q3 in all 7 of its subject categories. By category: Process Chemistry and Technology: Q3, #47 of 78; Surfaces, Coatings and Films: Q3, #77 of 142; Instrumentation: Q3, #91 of 165; Electronic, Optical and Magnetic Materials: Q3, #174 of 279; Materials Chemistry: Q3, #187 of 331; Condensed Matter Physics: Q3, #265 of 443; Electrical and Electronic Engineering: Q3, #432 of 811. Quartiles split the journals in a subject category into four equal groups by SJR, so Q1 is the most-cited quarter and Q4 the least; Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena is cited about 2.1 times per paper over two years, with an h-index of 63.

The Web of Science quartile comes from Clarivate's Journal Citation Reports (JCR), a proprietary product we neither license nor compute — so we cannot state a JCR quartile for Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. The open equivalent is its Scimago quartile, Q3, derived from Scopus citation data. Because JCR ranks against Web of Science and Scimago against Scopus, the two can differ, so check Clarivate's site directly if you need the JCR quartile specifically.

Our index records its access status as "hybrid". Where this is derived from publisher-level signals rather than works-level data it is a heuristic, so confirm on the journal's own site — particularly if an article processing charge matters to you.